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AZ3312
AZ3312 is the recommended photoresist to acheive 0.5 micron features.

Photolithography Process

Notes:

For 0.5 micron features, include the following steps:
  • Use hard contact exposure.
  • Clean the mask in between each exposure.
Results:
Channel Width (um) x Separation (um)SEM Characterization
0.5x0.5
0.5x1
0.5x4
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