AZ3312
AZ3312 is the recommended photoresist to acheive 0.5 micron features.

Photolithography Process

Notes:

For 0.5 micron features, include the following steps:

• Use hard contact exposure.
• Clean the mask in between each exposure.

Results:

Channel Width (um) x Separation (um)	SEM Characterization
0.5x0.5
0.5x1
0.5x4