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AZ3330
AZ3330 is the recommended photoresist for thick resist applications.

Photolithography Process

Notes:

Results:
Channel Width (um) x Separation (um)Exposure Time (s)SEM Characterization
1x18
1x110
1x210
AZ3330 can also be reflowed to make a half-cylinder shapePlace on hot plate at 250C for 20 min. This SEM shows reflowed AZ3330 covered by Oxide
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