AZ3330
AZ3330 is the recommended photoresist for thick resist applications.

Photolithography Process

Notes:

Results:

Channel Width (um) x Separation (um)	Exposure Time (s)	SEM Characterization
1x1	8
1x1	10
1x2	10
AZ3330 can also be reflowed to make a half-cylinder shape	Place on hot plate at 250C for 20 min. This SEM shows reflowed AZ3330 covered by Oxide