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AZ 3330 Adhesion to Glass



Working with AZ 3330 on glass surfaces can be difficult without proper surface treatment. AZ 3330 photoresist features (especially small features) on the glass or borofloat wafers will usually be damaged, deformed, or even nonexistent if the photoresist adhesion process is not done properly. Below are three possible photoresist adhesion processes listed with the most successful method first.
  1. Procedure 1: RIE Carbon Tetrafluoride Etch


  2. Procedure 2: Buffered Hydrofluoric Acid Etch


  3. Procedure 3: RIE Oxygen Etch

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