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AZ nLOF2020
AZ nLOF2020 is the recommended photoresist for negative lift-off applications.

Photolithography Process

Notes:

Recommended exposure times:
  1. Positive Mask (Channels): 7 seconds
  2. Negative Mask (Lines): 8 seconds


To Lift off:
  1. Immerse in NMP solution at 80 degrees C
Results:
Channel Width (um) x Separation (um)Mask TypeSEM Characterization
1x1Positive
1x1Negative
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