AZ nLOF2020
AZ nLOF2020 is the recommended photoresist for negative lift-off applications.

Photolithography Process

Notes:

Recommended exposure times:

1. Positive Mask (Channels): 7 seconds
2. Negative Mask (Lines): 8 seconds

To Lift off:

1. Immerse in NMP solution at 80 degrees C

Results:

Channel Width (um) x Separation (um)	Mask Type	SEM Characterization
1x1	Positive
1x1	Negative