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Positive Photoresist Photolithography Process


Lithography consists of six basic steps: Wafer Preparation, Photoresist coat, Softbake, Exposure, Development, and Post-Exposure Bake.

Note: Carry the wafers being processed in a quartz wafer carrier during the lithography process.
  1. Prepare Wafer

  2. Apply Photoresist

  3. Softbake

  4. Expose

  5. Develop

  6. Post Exposure Bake




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