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Negative Photoresist Photolithography Process


Lithography consists of six basic steps: Wafer Preparation, applying the photoresist coat, softbaking, exposing, post-exposure baking, and development.

Notes: Carry the wafers being processed in a quartz wafer carrier during the lithography process.
  1. Prepare Wafer

  2. Apply Photoresist

  3. Softbake

  4. Expose

  5. Post Exposure Bake

  6. Develop








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