BYU Home page BRIGHAM YOUNG UNIVERSITY  
Search the Cleanroom:
Home   |   Contact   |   Site Map
Navigation Menu




Shipley 1.2L

Shipley 1.2L is useful for many thin photoresist applications.

Photolithography Process

Notes:

For 0.5 micron features, include the following steps:
  • Use hard contact exposure.
  • Clean the mask in between each exposure.

Results (Using the method used on the chemicals and materials table):
Channel Width (um) x Separation (um)SEM Characterization
0.5x0.5
1x1
1x8






Maintained by ECEn IMMERSE Web Team.
Copyright © 1994-2009. Brigham Young University. All Rights Reserved.