BRIGHAM YOUNG UNIVERSITY
Search the Cleanroom:
Home
|
Contact
|
Site Map
Cleanroom Home
Microfabrication Processes
Photoresist Recipes
Shipley 1.8M
Navigation Menu
Cleanroom Home
Photonics Home
Semiconductor Properties
Everything Wafers
Microfabrication Processes
Optical References
Cleanroom Equipment
Safety and Protocol
User Resources
External Links
Shipley 1.8M
Shipley 1.8M is useful for thick photoresist applications that require good adhesion.
Photolithography Process
Notes:
Results:
Channel Width (um) x Separation (um)
SEM Characterization
1x1
1x2
Maintained by
ECEn IMMERSE Web Team
.
Copyright © 1994-2009. Brigham Young University. All Rights Reserved.