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PECVD 1 Depositon
Equipment Information for PECVD 1
SCHEDULER IS REQUIRED


PECVD 1 Deposition Recipes

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  1. Note: The silane MFC has been changed (again), so all recipes use different gas flows
  2. Do not use the old recipes - they don't work. (Updated 5/9/08)

  3. Flow Rates
  4. Silicon Dioxide, SiO2 - Low Pressure Recipe
  5. Silicon Dioxide, SiO2 - High Pressure Recipe
  6. Silicon OxyNitride, SiOxNy - Not yet recharacterized
  7. Silicon Nitride, SiNx
  8. Nitride Seasoning
  9. Amorphous Silicon, Si - High Pressure Recipe - Not yet recharacterized
  10. CF4Chamber Clean




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