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Ion Implantation: Projected Range & Straggle Calculator

Substrate:   Si
  Amorphous Si
  SiO2
  Si3N4
Dopant:   Arsenic
  Boron
  Phosphorus
Ion Energy: [keV] (0-200)

Projected Range: [µm]
Projected Straggle: [µm]


Click here for a list of Ion Implantation Houses.

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