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Silicon Nitride RIE Etching
Equipment: Reactive Ion Etcher (RIE)

SCHEDULER IS REQUIRED

Other material RIE etching: Silicon, SiO2, photoresist

Simple Recipe
  1. Recipe
    1. Power: 100 W
    2. Pressure: 100 mTorr
    3. Gases: 3.1 SCCM O2, 25 SCCM CF4
  2. Etch Rate: unknown
  3. Selectivity: unknown

Detail
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