Photoresist RIE Etching
Equipment: Reactive Ion Etcher (RIE)

SCHEDULER IS REQUIRED

Other material RIE etching: Silicon, SiO2, Nitride

Simple Recipe

1. Recipe
1. Power: 100 W
2. Pressure: 100 mTorr
3. Gases: 10 SCCM O₂, 0 SCCM CF₄
2. Etch Rate: unknown
3. Selectivity: infinite

Detail