Bruce Tube Furnace

High temperature furnance for wafer thermal oxide growth, wafer dopant diffusion, and metallization annealing.

 

    Denton E-beam Evaporator

    High temperature deposition of most metals.

     

      Denton Sputtering Machine

      Sputtered deposition of various materials including Tungsten, Silicon Nitride, Silicon Dioxide, and Chrome.

       

        PlasmaTherm 1

        Plasma deposition of SiO2, SiOxNy, and Si3N4films. This machine is currently dedicated to producing silicon nitride films.

         

          PlasmaTherm 2

          Plasma deposition of SiO2, SiOxNy, and Si3N4films. This machine is currently dedicated to producing silicon dioxide films.

           

            PECVD 3

            Plasma deposition of SiO2, SiOxNy, and Si3N4films. This machine is currently dedicated to producing silicon dioxide films.

             

              Thermal Evaporator

              Multi-boat metal deposition of gold and aluminum.