Thin Film Evaporation
Common Materials Reference and Guide
For more information on evaporation see this Metal Deposition page. Follow links to process details.
In the preparation of this guide, every effort has been made to ensure accuracy, clarity and completeness. Unfortunately, in a work of this scope, errors are inevitable. Neither Edward Graper nor Lebow Corporation warrantees the accuracy of this information or the results of it's application. Use this information, at your own risk, as a general guide only. Use an independent check for important data. This guide may not be reproduced in any part without written from Lebow Corporation, which will generally be granted.
Copyright Lebow Corporation 1990, All Rights Reserved.
Element | Symbol | Melting Point °C |
Density (bulk, g/cm3) | Z-ratio | Temperature°C @ Vapor Pressure (Torr) | Evaporation Method | Crucible | Boat | Remarks | ||
---|---|---|---|---|---|---|---|---|---|---|---|
10-8 | 10-6 | 10-4 | |||||||||
Aluminum | Al | 660 | 2.700 | 1.080 | 677 | 821 | 1010 | eBeam (Xlnt), Thermal | TiB2-BN, ZrB2, BN | TiB2,W | Alloys and wets. Fill Boat 2/3. |
Aluminum Antimonide |
AlSb | 1080 | 4.3 | -- | -- | -- | -- | -- | -- | -- | -- |
Aluminum Arsenide |
AlAs | 1600 | 3.7 | -- | -- | -- | ~1300 | -- | - | -- | -- |
Aluminum Bromide |
AlBr3 | 97 | 3.01 | -- | -- | -- | ~50 | -- | G | Mo | -- |
Aluminum Carbide |
Al4C3 | 1400 | 2.36 | -- | -- | -- | ~800 | ebeam (Fair) | -- | -- | n = 2.7 |
Aluminum 2% Copper |
Al2%Cu | 640 | 2.8 | -- | -- | -- | -- | -- | -- | -- | Wire feed and flash. Difficult from dual sources |
Aluminum Fluoride |
AlF3 | 1257 | 3.07 | -- | 410 | 490 | 700 | eBeam (Poor) | G | Mo, W | n = 1.38 @ .55µ |
sublimes | ........sublimes........ | ||||||||||
Aluminum Nitride |
AlN | -- | 3.26 | -- | -- | -- | ~1750 | ebeam (Fair) | -- | -- | Decomposes. Reactive evaporate in 10-3 N2 with glow discharge. |
sublimes | |||||||||||
Aluminum Oxide (Alumina) |
Al2O3 | 2045 | 3.970 | 0.336 | -- | -- | 1550 | eBeam (Xlnt), sputter | -- | W | Sapphire xlnt in ebeam, forms smooth, hard films. n=1.66 |
Aluminum 2% Silicon |
Al2%Si | 640 | 2.6 | -- | -- | -- | 1010 | -- | TiB2-BN | -- | Wire feed and flash. Difficult from dual sources. |
Element | Symbol | Melting Point °C |
Density (bulk, g/cm3) | Z-ratio | Temperature°C @ Vapor Pressure (Torr) | Evaporation Method | Crucible | Boat | Remarks | ||
10-8 | 10-6 | 10-4 | |||||||||
Antimony | Sb | 630 | 6.68 | -- | 279 | 345 | 425 | eBeam (Poor) | BN, C, Al2O3 | Mo, Ta, Al2O3 Coated | Toxic. Evaporates well. Film structure is rate-dependent. |
........sublimes........ | |||||||||||
Antimony Telluride | Sb2Te3 | 619 | 6.50 | -- | -- | -- | 600 | -- | C | -- | Decomposes over 750 ° C |
Antimony Trioxide | Sb2O3 | 656 | 5.2 or 5.76 | -- | -- | -- | ~300 | eBeam (Good) | BN, Al2O3 | Pt | Toxic. Decomposes on W. n = 2.05 |
........sublimes........ | |||||||||||
Antimony Triselenide | Sb2Se3 | 611 | -- | -- | -- | -- | -- | -- | C | Ta | Stoichiometry variable |
Antimony Trisulphide | Sb2S3 | 550 | 4.64 | -- | -- | -- | ~200 | ebeam (Good) | Al2O3 | Mo, Ta | n = 3.01 @.55µ No Decomposition. |
Arsenic | As | 814 | 5.73 | -- | 107 | 150 | 210 | eBeam (Poor) | Al2O3, BeO, VC | C | Toxic. Sublimes rapidly at low temerature. |
........sublimes........ | |||||||||||
Arsenic Selenide | As2Se3 | 360 | 4.75 | -- | -- | -- | -- | -- | Al2O3, Quartz | -- | n = 2.41 @3.8µ JVST 10, 748(1973) |
Arsenic Trisulphide | As2S3 | 300 | 3.43 | -- | -- | -- | ~400 | ebeam (Fair) | Al2O3, Quartz | Mo | n = 2.8 JVST 10, 748(1973) |
Arsenic Tritelluride | As2Te3 | 362 | -- | -- | -- | -- | -- | -- | -- | Flash | JVST 10, 748(1975) |
Barium | Ba | 710 | 3.78 | -- | 545 | 627 | 735 | eBeam (Fair) | Metals | W, Ta, Mo | Wets w/o alloying - reacts with ceramics. |
Element | Symbol | Melting Point °C |
Density (bulk, g/cm3) | Z-ratio | Temperature°C @ Vapor Pressure (Torr) | Evaporation Method | Crucible | Boat | Remarks | ||
10-8 | 10-6 | 10-4 | |||||||||
Barium Chloride | BaCl2 | 962 | 3.86 | -- | -- | -- | ~650 | -- | -- | Ta, Mo | use general preheat to outgas. |
Barium Fluoride | BaF2 | 1280 | 4.83 | -- | -- | -- | ~700 | eBeam (Good) | -- | Mo | n = 1.29 @5µ JVST 21, 2052 (1982) Density Rate Dependent |
........sublimes........ | |||||||||||
Barium Oxide | BaO | 1923 | 5.72 or 5.32 | -- | -- | -- | ~1300 | ebeam (Poor) | Al2O3 | Pt | Decomposes slightly. n = 1.98 |
Barium Sulphide | BaS | 2200 | 4.25 | -- | -- | -- | 1100 | -- | -- | Mo | n = 2.16 |
Barium Titanate | BaTiO3 | Decomposes | 6.0 | -- | ........Decomposes........ | -- | -- | -- | Decomposes, yields free Ba from single source; sputtering preferred; or co-evaporate from 2 sources | ||
Beryllium | Be | 1278 | 1.85 | -- | 710 | 878 | 1000 | eBeam (Xlnt) | BeO, C, Vit. Carbon | W, Ta | Wets W/Mo/Ta. Metal powder and oxides are toxic. Evaporates easily. |
Beryllium Chloride | BeCl2 | 440 | 1.90 | -- | -- | -- | ~150 | -- | -- | -- | -- |
Beryllium Fluoride | BeF2 | 800 | 1.99 | -- | -- | -- | ~200 | eBeam (Good) | -- | -- | Toxic. |
........sublimes........ | |||||||||||
Beryllium Oxide | BeO | 2530 | 3.01 | -- | -- | -- | 1900 | ebeam (Good) | -- | -- | Powders toxic. No decomposition from EB guns. n = 1.72 |
Element | Symbol | Melting Point °C |
Density (bulk, g/cm3) | Z-ratio | Temperature°C @ Vapor Pressure (Torr) | Evaporation Method | Crucible | Boat | Remarks | ||
10-8 | 10-6 | 10-4 | |||||||||
Bismuth | Bi | 271 | 9.80 | -- | 330 | 410 | 520 | eBeam (Xlnt) | Al2O3, VC | W, Mo, Al2O3, Ta | Vapors are toxic. High resistivity. No shorting of baskets. |
Bismuth Fluoride | BiF3 | 727 | 8.75 | -- | -- | -- | ~300 | -- | G | -- | n = 1.74 @ 1µ, 1.64 @ 10µ App. Opt. 18, 105 (1979) |
........sublimes........ | |||||||||||
Bismuth Oxide | Bi2O3 | 820 | 8.9 | -- | -- | -- | ~1400 | ebeam (Poor) | -- | Pt | Vapors are toxic. n = 2.55. JVST 12, 63 (1975) |
Bismuth Selenide | Bi2Se3 | 710 | 7.66 | -- | -- | -- | ~650 | ebeam (Good) | G, Quartz | -- | Sputtering preferred; co-evaporate from 2 sources. |
Bismuth Telluride | Bi2Te3 | 585 | 7.85 | -- | -- | -- | ~600 | -- | G, Quartz | W, Mo | Sputtering preferred; co-evaporate from 2 sources. |
Bismuth Titanate | Bi2Ti2O7 | -- | -- | -- | ........Decomposes........ | -- | -- | -- | Decomposes. Sputtering preferred; or co-evaporate from 2 sources in 10-2O2. | ||
Bismuth Trisulphide | Bi2S3 | 685 | 7.39 | -- | -- | -- | -- | -- | -- | -- | n = 1.5 |
Boron | B | 2100 | 2.36 | 0.389 | 1278 | 1548 | 1797 | eBeam (Xlnt), sputter | C, VC | C | Material explodes with rapid cooling. Forms carbide with container. |
........sublimes........ | |||||||||||
Boron Carbide | B4C | 2350 | 2.50 | -- | 2500 | 2580 | 2650 | ebeam (xlnt) | -- | -- | similar to Chromium. |
Boron Nitride | BN | 2300 | 2.20 | -- | -- | -- | ~1600 | eBeam (Poor) | -- | -- | Sputtering preferred; Decomposes. |
........sublimes........ | |||||||||||
Boron Oxide | B2O3 | 460 | 1.82 | -- | -- | -- | ~1400 | ebeam (Good) | -- | Pt, Mo | n = 1.46 |
Boron Trisulphide | B2S3 | 310 | 1.55 | -- | -- | -- | 800 | -- | G | -- | -- |
Cadmium | Cd | 321 | 8.64 | -- | 64 | 120 | 180 | ebeam (Poor) | Al2O3, Quartz | W, Cb, Mo, Ta | Poisons vacuum systems, low sticking coefficient. |
Cadmium Antimonide | CdSb | 456 | 6.92 | -- | -- | -- | -- | -- | -- | -- | -- |
Cadmium Arsenide | Cd3As2 | 721 | 6.21 | -- | -- | -- | -- | -- | Quartz | -- | -- |
Element | Symbol | Melting Point °C |
Density (bulk, g/cm3) | Z-ratio | Temperature°C @ Vapor Pressure (Torr) | Evaporation Method | Crucible | Boat | Remarks | ||
10-8 | 10-6 | 10-4 | |||||||||
Cadmium Bromide | CdBr2 | 567 | 5.19 | -- | -- | -- | ~300 | -- | -- | -- | -- |
Cadmium Chloride | CdCl2 | 570 | 4.05 | -- | -- | -- | ~400 | -- | -- | -- | -- |
Cadmium Fluoride | CdF2 | 1070 | 6.64 | -- | -- | -- | ~500 | -- | -- | -- | n = 1.56 |
Cadmium Iodide | CdI2 | 400 | 5.30 | -- | -- | -- | ~250 | -- | -- | -- | -- |
Cadmium Oxide | CdO | 900 | 6.95 | -- | -- | -- | ~530 | -- | -- | -- | Disproportionates. n = 2.49 |
Cadmium Selenide | CdSe | 1264 | 5.81 | -- | -- | -- | 540 | eBeam (Good) | Al2O3, Quartz | Mo, Ta | Evaporates easily. n = 2.4 @.6µ |
........sublimes........ | |||||||||||
Cadmium Siliside | CdSiO2 | -- | -- | -- | -- | -- | ~600 | -- | -- | -- | Disproportionates. n = 1.69 |
Cadmium Sulphide | CdS | 1750 | 4.82 | -- | -- | -- | 550 | eBeam (Fair) | Al2O3, Quartz | W, Mo, Ta | Sticking Coefficient strongly affected by substrate temperature. Stoichiometry variable. n = 2.4. JVST 12, 188(1975) |
........sublimes........ | |||||||||||
Cadmium Telluride | CdTe | 1098 | 6.20 | -- | -- | -- | 450 | -- | -- | W, Mo, Ta | Stoichiometry depends in substrate temperature. n = 2.6. |
Calcium | Ca | 842 | 1.55 | -- | 272 | 357 | 459 | eBeam (Poor) | Al2O3, Quartz | W | Corrodes in air. |
........sublimes........ | |||||||||||
Calcium Fluoride | CaF2 | 1360 | 3.18 | -- | -- | -- | ~1100 | ebeam (Xlnt) | Quartz | W, Mo, Ta | Rate control important. Use gentle preheat to outgas. n = 1.2-1.4 |
Calcium Oxide | CaO | 2580 | 3.35 | -- | -- | -- | ~1700 | -- | ZrO2 | W, Mo | Forms volatile oxides with W and Mo. n = 1.84. |
Calcium Silicate | CaO - SiO2 | 1540 | 2.90 | -- | -- | -- | -- | ebeam(Good) | Quartz | -- | n = 1.61 |
Element | Symbol | Melting Point °C |
Density (bulk, g/cm3) | Z-ratio | Temperature°C @ Vapor Pressure (Torr) | Evaporation Method | Crucible | Boat | Remarks | ||
10-8 | 10-6 | 10-4 | |||||||||
Calcium Sulphide | CaS | -- | 2.18 | -- | -- | -- | 1100 | -- | -- | Mo | Decomposes. n = 2.14 |
sublimes | |||||||||||
Calcium Titanate | CaTiO3 | 1975 | 4.10 | -- | 1490 | 1600 | 1690 | ebeam (Poor) | -- | -- | Disproportionates except in sputtering. |
Calcium Tungstate | CaWO4 | 1620 | 6.06 | -- | -- | -- | -- | ebeam (Good) | -- | W | n = 1.92 |
Carbon (diamond) |
C | -- | 1.8-2.3 | 0.220 | 1657 | 1867 | 2137 | eBeam (Xlnt), sputter | -- | -- | EB preferred. Arc evaporation. Poor film adhesion. Sublimes. Vitreous carbon n = 1.47 |
sublimes | ........sublimes........ | ||||||||||
Cerium | Ce | 795 | 8.23 | -- | 970 | 1150 | 1380 | ebeam (Good) | Al2O3, BeO, VC | W, Ta | Films oxidize easily. |
Ceric Oxide | CeO2 | 2600 | 7.3 | -- | 1890 | 2000 | 2310 | eBeam (Good) | -- | W | Use 250-300° C substrate temperature. n = 2.2 - 2.4. Reacts with W. |
........sublimes........ | |||||||||||
Cerium Fluoride | CeF3 | 1418 | 6.16 | -- | -- | -- | ~900 | ebeam (Good) | -- | W, Mo, Ta | Use gentle preheat to outgas. n = 1.63@ .55µ |
Cerium Oxide | Ce2O3 | 1692 | 6.87 | -- | -- | -- | -- | ebeam (Fair) | -- | W | Alloys with source; use .015-.020 W boat. n = 1.95 |
Cesium | Cs | 28 | 1.87 | -- | -16 | +22 | +30 | -- | Quartz | S.S. | -- |
Cesium Bromide | CsBr | 636 | 4.44 | -- | -- | -- | ~400 | -- | -- | W | n = 1.70 |
Cesium Chloride | CsCl | 646 | 3.97 | -- | -- | -- | ~500 | -- | -- | W | n = 1.64 Hygroscopic |
Cesium Fluoride | CsF | 684 | 3.59 | -- | -- | -- | ~500 | -- | -- | W | -- |
Cesium Hydroxide | CsOH | 272 | 3.67 | -- | -- | -- | 550 | -- | -- | Pt | -- |
Cesium Iodide | CsI | 621 | 4.51 | -- | -- | -- | ~500 | -- | Pt, Quartz | W, Pt | n = 1.79 |
Chiolote | Na5Al3F14 | -- | 2.9 | -- | -- | -- | ~800 | -- | -- | Mo, W | n = 1.33 |
Element | Symbol | Melting Point °C |
Density (bulk, g/cm3) | Z-ratio | Temperature°C @ Vapor Pressure (Torr) | Evaporation Method | Crucible | Boat | Remarks | ||
10-8 | 10-6 | 10-4 | |||||||||
Chromium | Cr | 1890 | 7.200 | 0.305 | 837 | 977 | 1157 | eBeam (Good), Thermal | VC | W, Cr rod or strip | Films very adherent. High rates possible. |
........sublimes........ | |||||||||||
Chromium Boride | CrB | 2760 | 6.17 | -- | -- | -- | -- | -- | -- | -- | -- |
Chromium Bromide | CrBr2 | 842 | 4.36 | -- | -- | -- | 550 | -- | -- | Inconel | -- |
Chromium Carbide | Cr3C2 | 1890 | 6.68 | -- | -- | -- | ~2000 | ebeam (Fair) | -- | W | -- |
Chromium Chloride | CrCl2 | 824 | 2.75 | -- | -- | -- | 550 | -- | -- | Fe, Inconel | Sublimes easily. |
Chromium Oxide | Cr2O3 | 2435 | 5.21 | -- | -- | -- | ~2000 | ebeam (Good) | -- | W, Mo | Disproportionates to lower oxides, reoxidizes @600° C in air. n = 2.4 |
Chromium Silicide | Cr3Si | 1710 | 6.51 | -- | -- | -- | -- | -- | -- | -- | -- |
Chromium Silicon Monoxide | Cr-SiO | .......Influenced by Composition....... | ebeam (Good) | -- | W | Flash | |||||
Cobalt | Co | 1495 | 8.90 | -- | 850 | 990 | 1200 | eBeam (Xlnt) | Al2O3, BeO | W, Cb | Alloys with refractory metals. |
Cobalt Bromide | CoBr2 | 678 | 4.91 | -- | -- | -- | 400 | -- | -- | Inconel | -- |
........sublimes........ | |||||||||||
Cobalt Chloride | CoCl2 | 740 | 3.36 | -- | -- | -- | 472 | -- | -- | Inconel | -- |
........sublimes........ | |||||||||||
Cobalt Oxide | CoO | 1935 | 5.68 | -- | -- | -- | -- | -- | -- | -- | Sputtering preferred. |
Copper | Cu | 1083 | 8.920 | 0.437 | 727 | 857 | 1017 | eBeam (Xlnt), Thermal |
Al2O3, Mo, Ta | W, Mo | Films do not adhere well. Use intermediate layer, e.g. Chromium. Evaporates from any source material. |
Element | Symbol | Melting Point °C |
Density (bulk, g/cm3) | Z-ratio | Temperature°C @ Vapor Pressure (Torr) | Evaporation Method | Crucible | Boat | Remarks | ||
10-8 | 10-6 | 10-4 | |||||||||
Copper Chloride | CuCl | 422 | 3.53 | -- | -- | -- | ~600 | -- | -- | -- | n = 1.93 |
Copper Oxide | Cu2O | 1235 | 6.0 | -- | -- | -- | ~600 | eBeam (Good), Thermal | Al2O3 | Ta | Evaporate in 10-2-10-4 of O2; n = 2.70. J. Electrochem. Soc. 110, 119(1967) |
........sublimes........ | |||||||||||
Copper Sulfide | CuS | 1113 | 6.75 | -- | -- | -- | ~500 | -- | -- | -- | n = 1.45 |
........sublimes........ | |||||||||||
Cryolite | Na3AlF6 | 1000 | 2.9 | -- | 1020 | 1260 | 1480 | eBeam (Xlnt) | VC | W, Mo, Ta | Large chunks reduce spitting. Little decomposition. n = 2.34 at 6330A App. Opt. 15, 1969(1976) |
Dysprosium | Dy | 1409 | 8.54 | -- | 625 | 750 | 900 | ebeam (Good) | -- | Ta | -- |
Dysprosium Fluoride | DyF3 | 1360 | 6.0 | -- | -- | -- | ~800 | eBeam (Good) | -- | Ta | -- |
........sublimes........ | |||||||||||
Dysprosium Oxide | Dy2O3 | 2340 | 7.81 | -- | -- | -- | ~1400 | -- | -- | Ir | Loses Oxygen. |
Erbium | Er | 1497 | 9.060 | 0.740 | 650 | 775 | 930 | eBeam (good), Thermal | -- | W,Ta | Sublimes |
........sublimes........ | |||||||||||
Erbium Fluoride | ErF3 | 1350 | 7.81 | -- | -- | -- | ~750 | -- | -- | Mo | JVST A3 (6) 2320 |
Erbium Oxide | Er2O3 | 2400 | 8.64 | -- | -- | -- | ~1600 | -- | -- | Ir | Loses Oxygen. |
Europium | Eu | 822 | 5.26 | -- | 280 | 360 | 480 | eBeam (Fair) | Al2O3 | W,Ta | Low Tantalum solubility. |
........sublimes........ | |||||||||||
Europium Fluoride | EuF2 | 1380 | 6.5 | -- | -- | -- | ~950 | -- | -- | Mo | -- |
Europium Oxide | Eu2O3 | 2056 | 7.42 | -- | -- | -- | ~1600 | ebeam (Good) | ThO2 | Ir, Ta, W | Loses Oxygen; films clear and hard. |
Europium Sulphide | EuS | -- | 5.75 | -- | -- | -- | -- | ebeam (Good) | -- | -- | -- |
Element | Symbol | Melting Point °C |
Density (bulk, g/cm3) | Z-ratio | Temperature°C @ Vapor Pressure (Torr) | Evaporation Method | Crucible | Boat | Remarks | ||
10-8 | 10-6 | 10-4 | |||||||||
Gadolinium | Gd | 1312 | 7.89 | -- | 760 | 900 | 1175 | ebeam (Xlnt) | Al2O3 | Ta | High Ta solubility. |
Gadolinium Oxide | Gd2O3 | 2310 | 7.41 | -- | -- | -- | -- | ebeam (Fair) | -- | Ir | Loses Oxygen; n = 1.8 @ .55µ |
Gallium | Ga | 30 | 5.90 | -- | 619 | 742 | 907 | ebeam (Good) | Al2O3, BeO, Quartz | -- | Alloys with refractory metals. Use EB gun. |
Gallium Atimonide | GaSb | 710 | 5.6 | -- | -- | -- | -- | ebeam (Fair) | -- | W, Ta | Flash Evaporate. |
Gallium Arsenide | GaAs | 1238 | 5.3 | -- | -- | -- | -- | ebeam (Good) | Carbon | W, Ta | Flash Evaporate. n = 5.64 @ 10.6µ |
Gallium Nitride | GaN | -- | 6.1 | -- | -- | -- | ~200 | Al2O3 | -- | -- | Evaporate Ga in 10-3 N2. |
sublimes | |||||||||||
Gallium Oxide (β) | Ga2O3 | 1900 | 5.88 | -- | -- | -- | -- | -- | -- | Pr, W | Loses Oxygen. |
Gallium Phosphide | GaP | 1540 | 4.1 | -- | -- | 770 | 920 | -- | Quartz | W, Ta | Decomposes vapor mostly P. |
Germanium | Ge | 937 | 5.350 | 0.516 | 812 | 957 | 1167 | eBeam (Xlnt) | Al2O3, Quartz |
W, C, Ta | Excellent films from EB sources. Use .040 W. n = 4.01 |
Germanium Nitride | Ge3N2 | 450 | 5.2 | -- | -- | -- | ~650 | -- | -- | -- | Sputtering preferred. |
........sublimes........ | |||||||||||
Germanium Oxide | GeO2 | 1086 | 6.24 | -- | -- | -- | ~625 | ebeam(Good) | Quartz, Al2O3 | Ta, Mo | Similar to SiO, film predominantly GeO. |
Germanium Telluride | GeTe | 725 | 6.20 | -- | -- | -- | 381 | -- | Quartz, Al2O3 | W, Mo | -- |
Glass Schott 8329 | -- | -- | 2.20 | -- | -- | -- | -- | ebeam (Xlnt) | -- | -- | Evaporable alkali glass. Melt in air before evaporating. n = 1.47. |
Gold | Au | 1062 | 19.320 | 0.381 | 807 | 947 | 1132 | eBeam (Xlnt), Thermal | BN, Al2O3, VC | W, Mo, Al2O3 | May not adhere well. Films soft. |
Hafnium | Hf | 2230 | 13.09 | -- | 2160 | 2250 | 3090 | eBeam (Good) | -- | -- | -- |
Element | Symbol | Melting Point °C |
Density (bulk, g/cm3) | Z-ratio | Temperature°C @ Vapor Pressure (Torr) | Evaporation Method | Crucible | Boat | Remarks | ||
10-8 | 10-6 | 10-4 | |||||||||
Hafnium Boride | HfB2 | 3250 | 10.5 | -- | -- | -- | -- | -- | -- | -- | -- |
Hafnium Carbide | HfC | 4160 | 12.2 | -- | -- | -- | ~2600 | -- | -- | -- | -- |
........sublimes........ | |||||||||||
Hafnium Nitride | HfN | 2852 | 13.8 | -- | -- | -- | -- | -- | -- | -- | -- |
Hafnium Oxide | HfO2 | 2812 | 9.68 | -- | -- | -- | ~2500 | ebeam (Fair) | -- | W | Film HfO n = 2.0 @ .5µ App. Opt. Apr. 1977 |
Hafnium Silicide | HfSi2 | 1750 | 7.2 | -- | -- | -- | -- | -- | -- | -- | -- |
Holmium | Ho | 1470 | 8.80 | -- | 650 | 770 | 950 | ebeam (Good) | -- | W, Ta | -- |
........sublimes........ | |||||||||||
Holmium Fluoride | HoF3 | 1143 | 7.64 | -- | -- | -- | ~800 | -- | Quartz | -- | -- |
Holmium Oxide | Ho2O3 | 2370 | 8.41 | -- | -- | -- | -- | -- | -- | Ir | Loses Oxygen. |
Inconel | Ni/Cr/Fe | 1425 | 8.5 | -- | -- | -- | -- | ebeam (Good) | -- | W | Use fine wire pre-wrapped on W. Low rate req'd. for smooth films. |
Indium | In | 157 | 7.30 | 0.841 | 487 | 597 | 742 | eBeam (Xlnt) | G, Al2O3, Mo liner |
W, Mo | Wets W and Cu. use Mo liner in gun. |
Indium Antimonide | InSb | 535 | 5.8 | -- | 500 | -- | ~400 | -- | -- | W | Toxic. Decomposes; sputtering preferred; or co-evaporate from 2 sources; flash. n = 4.3 @ 1µ |
Indium Arsenide | InAs | 943 | 5.7 | -- | 780 | 870 | 970 | -- | -- | W | Toxic. Sputtering preferred; or co-evaporate from 2 sources; flash. n = 4.5 @ 1µ |
Indium Oxide | In2O3 | 1565 | 7.18 | -- | -- | -- | ~1200 | ebeam (Good) | Al2O3 | W, Pt | Film In2O; transparent conductor. JVST 12, 99(1975) |
........sublimes........ | |||||||||||
Indium Phosphide | InP | 1058 | 4.8 | -- | -- | 630 | 730 | -- | G | W, Ta | Deposits P. rich. Flash evaporate. |
Indium Selenide | In2Se3 | 890 | 5.7 | -- | -- | -- | -- | -- | -- | -- | Sputtering preferred; or co-evaporate from 2 sources; flash. |
Element | Symbol | Melting Point °C |
Density (bulk, g/cm3) | Z-ratio | Temperature°C @ Vapor Pressure (Torr) | Evaporation Method | Crucible | Boat | Remarks | ||
10-8 | 10-6 | 10-4 | |||||||||
Indium Sesquisulphide | In2S3 | 1050 | 4.90 | -- | -- | -- | 850 | -- | G | -- | Film In2S |
........sublimes........ | |||||||||||
Indium Sulphide | In2S | 653 | 5.87 | -- | -- | -- | 650 | -- | G | -- | -- |
Indium Telluride | In2Te3 | 667 | 5.8 | -- | -- | -- | -- | -- | -- | -- | Sputtering preferred; or co-evaporate from 2 sources; flash. |
Indium Tin Oxide | In2O3-SnO2 | 1800 | 6.43-7.14 | -- | -- | -- | -- | eBeam (good) | G | W, Mo | Sublimes. 90 In203:10 Sn02 wt%. anneal req. for transparancy and improved conductivity. |
Iridium | Ir | 2459 | 22.65 | -- | 1850 | 2080 | 2380 | ebeam (Fair) | ThO2 | -- | -- |
Iron | Fe | 1535 | 7.860 | 0.349 | 858 | 998 | 1180 | eBeam (Xlnt) | BeO, Al2O3 | W | Attacks Tungsten. Use gentle preheat to outgas. Films hard, smooth. |
Iron Bromide | FeBr2 | 689 | 4.64 | -- | -- | -- | 561 | -- | Fe | -- | -- |
Iron Chloride | FeCl2 | 670 | 2.98 | -- | -- | -- | 300 | -- | Fe | -- | -- |
........sublimes........ | |||||||||||
Iron Iodide | FeI2 | 592 | 5.31 | -- | -- | -- | 400 | -- | Fe | -- | -- |
Iron Oxide | FeO | 1425 | 5.7 | -- | -- | -- | -- | ebeam (Poor) | -- | -- | Decomposes; sputtering preferred. |
Iron Oxide | Fe2O3 | 1565 | 5.24 | -- | -- | -- | -- | ebeam (Good) | -- | W | Disproportionates at Fe3O4 at 1530° C, n = 3.0 |
Iron Sulphide | FeS | 1195 | 4.84 | -- | -- | -- | -- | -- | Al2O3 | -- | Decomposes. |
Kanthal | FeCrAl | 1500 | 7.1 | -- | -- | -- | ~1150 | -- | -- | W | JVST 7, 739(1980) |
Element | Symbol | Melting Point °C |
Density (bulk, g/cm3) | Z-ratio | Temperature°C @ Vapor Pressure (Torr) | Evaporation Method | Crucible | Boat | Remarks | ||
10-8 | 10-6 | 10-4 | |||||||||
Lanthanum | La | 920 | 6.17 | -- | 990 | 1212 | 1388 | ebeam (Xlnt) | Al2O3 | W, Ta | Films will burn in air if Scraped. |
Lanthanum Boride | LaB6 | 2210 | 2.61 | -- | -- | -- | -- | ebeam (Good) | -- | -- | -- |
Lanthanum Bromide | LaBr3 | 783 | 5.06 | -- | -- | -- | -- | -- | -- | -- | n = 1.94 Hygroscopic |
Lanthanum Fluoride | LaF3 | 1490 | 6.0 | -- | -- | -- | 900 | ebeam (Good) | -- | Ta, Mo | No Decomposition. n = 1.59 @ .55µ |
........sublimes........ | |||||||||||
Lanthanum Oxide | La2O3 | 2250 | 5.84 | -- | -- | -- | 1400 | ebeam (Good) | -- | W, Ta | Loses oxygen. n = 1.9 @ .5µ |
Lead | Pb | 328 | 11.34 | 1.130 | 342 | 427 | 497 | eBeam (xlnt), Thermal | Quartz, Al2O3 | W, Mo | Toxic. Carefully controlled rates req'd. for superconductors. |
Lead Bromide | PbBr2 | 373 | 6.66 | -- | -- | -- | ~300 | -- | -- | -- | -- |
Lead Chloride | PbCl2 | 501 | 5.85 | -- | -- | -- | ~325 | -- | Al2O3 | Pt | Little decomposition. n = 2.2 |
Lead Fluoride | PbF2 | 822 | 8.24 | -- | -- | -- | ~400 | -- | BeO | W, Pt, Mo | Toxic. n = 1.75 @ .3µ |
........sublimes........ | |||||||||||
Lead Iodide | PbI2 | 502 | 6.16 | -- | -- | -- | ~500 | -- | Quartz | Pt | n = 2.7 J.Opt. Soci. 65, 914 |
Lead Oxide | PbO | 890 | 9.53 | -- | -- | -- | ~550 | -- | Quartz, Al2O3 | Pt | No Decomposition. n = 2.55 |
Lead Stannate | PbSnO3 | 1115 | 8.1 | -- | 670 | 780 | 905 | ebeam (Poor) | Al2O3 | Pt | Disproportionates. |
Lead Selenide | PbSe | 1065 | 8.10 | -- | -- | -- | ~500 | -- | G, Al2O3 | W, Mo | -- |
........sublimes........ | |||||||||||
Lead Sulphide | PbS | 1114 | 7.5 | -- | -- | -- | 550 | -- | Quartz, Al2O3 | W | Little Decomposition. n = 3.91 |
........sublimes........ | |||||||||||
Lead Telluride | PbTe | 917 | 8.16 | -- | 780 | 910 | 1050 | -- | G, Al2O3 | Mo, Pt, Ta | Vapors toxic. Deposits Te rich. Sputtering preferred, or co-evaporate from sources. n = 5.6 @ 5µ |
Lead Titanate | PbTiO3 | -- | 7.52 | -- | -- | -- | -- | -- | -- | Ta | -- |
Lithium | Li | 179 | 0.53 | -- | 227 | 307 | 407 | ebeam (Good) | BeO, Al2O3 | Ta, S.S. | Metal reacts violently in air. |
Element | Symbol | Melting Point °C |
Density (bulk, g/cm3) | Z-ratio | Temperature°C @ Vapor Pressure (Torr) | Evaporation Method | Crucible | Boat | Remarks | ||
10-8 | 10-6 | 10-4 | |||||||||
Lithium Bromide | LiBr | 547 | 3.46 | -- | -- | -- | ~500 | -- | -- | Ni | n = 1.78 |
Lithium Chloride | LiCl | 613 | 2.07 | -- | -- | -- | 400 | -- | -- | Ni | Use gentle preheat for outgas. n = 1.66 |
Lithium Fluoride | LiF | 870 | 2.60 | -- | 875 | 1020 | 1180 | ebeam (Good) | Al2O3 | Ni, Ta, Mo, W | Rate control important for optical films. Use gentle preheat for outgas. n = 1.36. J. Appl. Opt. 11, 2245(1972) |
Lithium Iodide | LiI | 446 | 4.06 | -- | -- | -- | 400 | -- | -- | Mo, W | -- |
Lithium Oxide | Li2O | 1427 | 2.01 | -- | -- | -- | 850 | -- | -- | Pt, Ir | n = 1.64 |
Lutetium | Lu | 1652 | 9.84 | -- | -- | -- | 1300 | ebeam (Xlnt) | Al2O3 | Ta | -- |
Lutetium Oxide | Lu2O3 | 2489 | 9.41 | -- | -- | -- | 1400 | -- | -- | Ir | Decomposes. |
Magnesium | Mg | 651 | 1.74 | -- | 185 | 247 | 327 | ebeam (Good) | VC, Al2O3 | W, Mo, Ta, Cb | Extremely hich rates possible. |
........sublimes........ | |||||||||||
Magnesium Aluminate | MgAl2O4 | 2135 | 3.6 | -- | -- | -- | -- | ebeam (Good) | -- | -- | Natural spinel. |
Magnesium Bromide | MgBr2 | 700 | 3.72 | -- | -- | -- | ~450 | -- | -- | Ni | Decomposes. |
Magnesium Chloride | MgCl2 | 708 | 2.32 | -- | -- | -- | 400 | -- | -- | Ni | Decomposes. n = 1.6 |
Magnesium Fluoride | MgF2 | 1266 | 2.9-3.2 | -- | -- | -- | 1000 | ebeam (Xlnt) | Al2O3 | Mo, Ta | Rate control and substrate heat important for optical films. n = 1.38 J. Appl. Opt. 11, 2245(1972) |
Magnesium Iodide | MgI2 | 700 | 4.24 | -- | -- | -- | 200 | -- | -- | Ir | -- |
Magnesium Oxide | MgO | 2800 | 3.58 | -- | -- | -- | 1300 | ebeam (Good) | C, Al2O3 | -- | W produces volatile oxides. n = 1.7 J. Appl. Opt.11, 2243 (1972) |
Manganese | Mn | 1244 | 7.20 | -- | 507 | 572 | 647 | ebeam (Good) | BeO, Al2O3 | W, Mo, Ta | -- |
........sublimes........ | |||||||||||
Element | Symbol | Melting Point °C |
Density (bulk, g/cm3) | Z-ratio | Temperature°C @ Vapor Pressure (Torr) | Evaporation Method | Crucible | Boat | Remarks | ||
10-8 | 10-6 | 10-4 | |||||||||
Manganese Bromide | MnBr2 | 695 | 4.38 | -- | -- | -- | 500 | -- | -- | Inconel | -- |
Manganese Chloride | MnCl2 | 650 | 2.98 | -- | -- | -- | 450 | -- | -- | Inconel | -- |
Manganese Oxide | Mn3O4 | 1705 | 4.86 | -- | -- | -- | -- | -- | -- | W | -- |
Manganese Sulphide | MnS | 1615 | 3.99 | -- | -- | -- | 1300 | -- | -- | Mo | Decomposes. n = 2.7 |
Mercury | Hg | -39 | 13.55 | -- | -68 | -42 | -6 | -- | -- | -- | -- |
Mercury Sulphide | HgS | -- | 8.10 | -- | -- | -- | 250 | -- | Al2O3 | -- | Decomposes. |
sublimes | ........sublimes........ | ||||||||||
Molybdenum | Mo | 2610 | 10.22 | -- | 1592 | 1822 | 2117 | ebeam (Xlnt) | -- | -- | Films smooth, hard. Careful degas req'd. |
Molybdenum Boride | MoB2 | 2100 | 7.12 | -- | -- | -- | -- | ebeam (Poor) | -- | -- | -- |
Molybdenum Carbide | Mo2C | 2687 | 9.18 | -- | -- | -- | -- | ebeam (Fair) | -- | -- | Evaporation of Mo(CO)6 yeilds Mo2C |
Molybdenum Disulphide | MoS2 | 1185 | 4.80 | -- | -- | -- | ~50 | -- | -- | -- | -- |
Molybdenum Silicide | MoSi2 | 2050 | 6.3 | -- | -- | -- | ~50 | -- | -- | W | Decomposes. |
Molybdenum Trioxide | MoO3 | 795 | 4.70 | -- | -- | -- | ~900 | -- | Al2O3, BN | Mo, Pt | Slight O2 loss. n = 1.9 |
Neodymium | Nd | 1024 | 7.00 | -- | 731 | 871 | 1062 | ebeam (Xlnt) | Al2O3 | Ta | Low Ta solubility. |
Neodymium Fluoride | NdF3 | 1410 | 6.5 | -- | -- | -- | ~900 | ebeam (Good) | Al2O3 | Mo, W | Very little decomposition. n = 1.61 @.55µ |
Neodymium Oxide | Nd2O3 | 2272 | 7.24 | -- | -- | -- | ~1400 | ebeam (Good) | ThO2 | Ta, W | Loses oxygen, films clear, EB preferred. Hygroscopic n = 1.79 n varies with substrate temp. |
Nichrome IV | Ni/Cr | 1395 | 8.50 | 0.3258 | 847 | 987 | 1217 | ebeam (Xlnt) | Al2O3, VC, BeO | W, Al2O3 coated | Alloys with refractory metals. |
Nickel | Ni | 1453 | 8.910 | 0.331 | 927 | 1072 | 1262 | eBeam (xlnt), Thermal | Al2O3, BeO, CG | W | Alloys with refractory metals. Forms smooth adherent films. |
Nickel Bromide | NiBr2 | 963 | 4.64 | -- | -- | -- | 362 | -- | -- | Inconel | -- |
........sublimes........ | |||||||||||
Element | Symbol | Melting Point °C |
Density (bulk, g/cm3) | Z-ratio | Temperature°C @ Vapor Pressure (Torr) | Evaporation Method | Crucible | Boat | Remarks | ||
10-8 | 10-6 | 10-4 | |||||||||
Nickel Chloride | NiCl2 | 1001 | 3.55 | -- | -- | -- | 444 | -- | -- | Inconel | -- |
........sublimes........ | |||||||||||
Nickel Oxide | NiO | 1990 | 7.45 | -- | -- | -- | ~1470 | -- | Al2O3 | -- | Dissociates upon heating n = 2.18 |
Niobium (Columbium) |
Nb | 2468 | 8.55 | -- | 1728 | 1977 | 2287 | ebeam (Xlnt) | -- | W | Attacks W source. |
Niobium Boride | NbB2 | 3050 | 6.97 | -- | -- | -- | -- | -- | -- | -- | -- |
Niobium Carbide | NbC | 3800 | 7.82 | -- | -- | -- | -- | ebeam (Fair) | -- | -- | -- |
Niobium Nitride | NbN | 2573 | 8.4 | -- | -- | -- | -- | -- | -- | -- | Reactive, evaporate Nb in 10-3 N2. |
Niobium Oxide | NbO | -- | 6.27 | -- | -- | -- | 1100 | -- | -- | Pt | -- |
Niobium Pentoxide | Nb2O5 | 1530 | 4.47 | -- | -- | -- | -- | -- | -- | W | n = 2.3 |
Niobium Telluride | NbTex | -- | 7.6 | -- | -- | -- | -- | -- | -- | -- | Composition variable. |
Niobium-Tin | Nb3Sn | -- | -- | -- | -- | -- | -- | ebeam (Xlnt) | -- | -- | Co-evaporate from 2 sources. |
Niobium Trioxide | Nb2O3 | 1780 | 7.5 | -- | -- | -- | -- | -- | -- | W | -- |
Osmium | Os | 1700 | 22.5 | -- | 2170 | 2430 | 2760 | ebeam (Fair) | -- | -- | -- |
Palladium | Pd | 1550 | 12.40 | -- | 842 | 992 | 1192 | ebeam (Xlnt) | Al2O3, BeO | W | Alloys with refractory metals; rapid evaporation suggested. Spits in EB. |
Palladium Oxide | PdO | 870 | 8.31 | -- | -- | -- | 575 | -- | Al2O3 | -- | Decomposes. |
Parylene (Union Carbide) | C8H8 | 300-400 | 1.1 | -- | -- | -- | -- | -- | -- | -- | Vapor depositable plastic. |
Permalloy | Ni/Fe | 1395 | 8.7 | -- | 947 | 1047 | 1307 | ebeam (Good) | Al2O3, VC | W | Film low in Ni content. Use 84% Ni source. JVST Vol. 7, No. 6, p. 573 |
Phosphorus | P | 41.4 | 1.82 | -- | 327 | 361 | 402 | -- | Al2O3 | -- | Metal reacts violently in air. |
Platinum | Pt | 1769 | 21.45 | 0.245 | 1292 | 1492 | 1747 | eBeam (xlnt), Thermal | CG, ThO2 | W | Alloys with metals; poor adhesion; films soft |
Plutonium | Pu | 635 | 19 | -- | -- | -- | -- | -- | -- | W | Toxic, radioactive |
Element | Symbol | Melting Point °C |
Density (bulk, g/cm3) | Z-ratio | Temperature°C @ Vapor Pressure (Torr) | Evaporation Method | Crucible | Boat | Remarks | ||
10-8 | 10-6 | 10-4 | |||||||||
Polonium | Po | 254 | 9.4 | -- | 117 | 170 | 244 | -- | Quartz | -- | Radioactive |
Potassium | K | 64 | .86 | -- | 23 | 60 | 125 | -- | Quartz | Mo | Metal reacts violently in air. Use gentle preheat to outgas. |
Potassium Bromide | KBr | 730 | 2.75 | -- | -- | -- | ~450 | -- | Quartz | Mo, Ta | Use gentle preheat to outgas. n = 1.56 |
Potassium Chloride | KCl | 776 | 1.98 | -- | -- | -- | 510 | ebeam (Good) | -- | Ta, Ni | Use gentle preheat to outgas. n = 1.49 |
Potassium Fluoride | KF | 880 | 2.48 | -- | -- | -- | ~500 | ebeam (Poor) | Quartz | -- | Use gentle preheat to outgas. n = 1.35 |
Potassium Hydroxide | KOH | 360 | 2.04 | -- | -- | -- | ~400 | -- | -- | Pt | Use gentle preheat to outgas. |
Potassium Iodide | KI | 72 | 3.13 | -- | -- | -- | ~500 | -- | -- | Ta | Use gentle preheat to outgas. n = 1.68 |
Praseodymium | Pr | 931 | 6.78 | -- | 800 | 950 | 1150 | ebeam (Good) | -- | Ta | -- |
Praseodymium Oxide | Pr2O3 | 2125 | 6.88 | -- | -- | -- | 1400 | ebeam (Good) | ThO2 | Ir | Loses oxygen. n = 2.0 |
Radium | Ra | 700 | 5.0 | -- | 246 | 320 | 416 | -- | -- | -- | -- |
Rhenium | Re | 3180 | 20.53 | -- | 1928 | 2207 | 2571 | ebeam (Poor) | -- | -- | Fine wire will self-evaporate. |
Rhenium Oxide | Re2O7 | 297 | 8.2 | -- | -- | -- | ~100 | -- | -- | -- | -- |
Rhodium | Rh | 1966 | 12.41 | -- | 1277 | 1472 | 1707 | ebeam (Good) | ThO2, VC | W | EB gun preferred. |
Rubidium | Rb | 38.5 | 1.47 | -- | -3 | 37 | 111 | -- | Quartz | -- | -- |
Rubidium Chloride | RbCl | 715 | 2.76 | -- | -- | -- | ~550 | -- | Quartz | -- | n = 1.49 |
Rubidium Iodide | RbI | 642 | 3.55 | -- | -- | -- | ~400 | -- | Quartz | -- | -- |
Ruthenium | Ru | 2700 | 12.45 | -- | 1780 | 1990 | 2260 | ebeam (Poor) | ThO2, VC | -- | Splits violently in EB. Requires degas. |
Samarium | Sm | 1072 | 7.54 | -- | 373 | 460 | 573 | ebeam (Good) | Al2O3 | Ta | -- |
Samarium Oxide | Sm2O3 | 2350 | 7.43 | -- | -- | -- | -- | ebeam (Good) | ThO2 | Ir | Loses O2. Films smooth, clear. |
Samarium Sulphide | Sm2S3 | 1900 | 5.72 | -- | -- | -- | -- | ebeam (Good) | -- | -- | AIP conf. Proc. on Mag. & Mag. Mat. B, 5, 860 (1971) |
Scandium | Sc | 1539 | 2.99 | -- | 714 | 837 | 1002 | ebeam (Xlnt) | Al2O3, BeO | W | Alloys with Ta |
Scandium Oxide | Sc2O3 | 2300 | 3.86 | -- | -- | -- | ~400 | ebeam (Fair) | -- | -- | Loses Oxygen. n = 1.88 @ .5µ |
Selenium | Se | 217 | 4.79 | -- | 89 | 125 | 170 | ebeam (Good) | Al2O3, VC | W, Mo | Toxic. Poisons vacuum systems. JVST 9, 387 (1972); 12, 573 & 807 (1975) |
Silicon | Si | 1410 | 2.42 | 0.712 | 992 | 1147 | 1337 | eBeam (Fair), sputter | BeO, Ta, VC | W, Ta | Alloys with W; use heavy W boat. SiO produced above 4x10-6 Torr. EB best. n = 3.42 App. Opt. 15, 2348 (1976) |
Element | Symbol | Melting Point °C |
Density (bulk, g/cm3) | Z-ratio | Temperature°C @ Vapor Pressure (Torr) | Evaporation Method | Crucible | Boat | Remarks | ||
10-8 | 10-6 | 10-4 | |||||||||
Silicon Boride | SiB6 | -- | 2.47 | -- | -- | -- | -- | ebeam (Poor) | -- | -- | -- |
Silicon Carbide | SiC | 2700 | 3.22 | -- | -- | -- | 1000 | -- | -- | -- | Sputtering preferred. |
Silicon Dioxide | SiO2 | 1610-1710 | 2.2-2.7 | 1.000 | -- | -- | ~1025 | eBeam (Xlnt), sputter | Al2O3 | -- | Quartz excellent in EB. n = 1.47 |
Influenced by composition | |||||||||||
Silicon Monoxide | SiO | 1702 | 2.1 | -- | -- | -- | 850 | eBeam (Fair) | Ta | W, Ta | Baffle box source best for resistance evaporation. Low rate suggested. n = 1.6. |
........sublimes........ | |||||||||||
Silicon Nitride | Si3N4 | -- | 3.44 | -- | -- | -- | ~800 | eBeam, sputter | -- | -- | n = 2.1 |
sublimes | |||||||||||
Silicon Selenide | SiSe | -- | -- | -- | -- | -- | 550 | -- | Quartz | -- | -- |
Silicon Sulphide | SiS | -- | 1.85 | -- | -- | -- | 450 | -- | Quartz | -- | -- |
sublimes | |||||||||||
Silicon Telluride | SiTe2 | -- | 4.39 | -- | -- | -- | 550 | -- | Quartz | -- | -- |
Silver | Ag | 961 | 10.49 | 0.529 | 847 | 958 | 1105 | eBeam (xlnt), Thermal | Al2O3, Mo | Mo, Ta | Evaporates well from any source. |
Silver Bromide | AgBr | 432 | 6.47 | -- | -- | -- | ~380 | -- | Quartz | Ta | n = 2.25 |
Silver Chloride | AgCl | 455 | 5.56 | -- | -- | -- | ~520 | -- | Quartz | Mo, Pt | n = 2.07 |
Silver Iodide | AgI | 558 | 5.67 | -- | -- | -- | ~500 | -- | -- | Ta | n = 2.21 |
Silver Iodide | AgI | 558 | 5.67 | -- | -- | -- | ~500 | -- | -- | Ta | n = 2.21 |
Sodium | Na | 97 | .97 | -- | 74 | 124 | 192 | -- | Quartz | Ta, S.S. | Use gentle preheat to outgas. Metal reacts violently in air. |
Sodium Bromide | NaBr | 755 | 3.20 | -- | -- | -- | ~400 | -- | Quartz | -- | Use gentle preheat to outgas. n = 1.64 |
Sodium Chloride | NaCl | 801 | 2.16 | -- | -- | -- | 530 | ebeam (Good) | Quartz | Ta, Mo, W | Cu ovens, little decomposition. Use gentle preheat to outgas. n = 1.54 |
Sodium Cyanide | NaCN | 563 | -- | -- | -- | -- | ~550 | -- | -- | Ag | Use gentle preheat to outgas. n = 1.45 |
Sodium Fluoride | NaF | 988 | 2.79 | -- | -- | -- | ~700 | ebeam (Good) | BeO | Mo, Ta, W | Use gentle preheat to outgas. No decomposition n = 1.30 @ .55µ |
Element | Symbol | Melting Point °C |
Density (bulk, g/cm3) | Z-ratio | Temperature°C @ Vapor Pressure (Torr) | Evaporation Method | Crucible | Boat | Remarks | ||
10-8 | 10-6 | 10-4 | |||||||||
Sodium Hydroxide | NaOH | 318 | 2.13 | -- | -- | -- | ~470 | -- | -- | Pt | Use gentle preheat to outgas. n = 1.36 |
Spinel | MgO3 5Al2O3 |
-- | 8.0 | -- | -- | -- | -- | ebeam (Good) | -- | -- | n = 1.72 |
Strontium | Sr | 769 | 2.6 | -- | 239 | 309 | 403 | ebeam (Poor) | VC | W, Ta, Mo | Wets but does not alloy with refractory metals. May react violently in air. |
Strontium Fluoride | SrF2 | 1190 | 4.24 | -- | -- | -- | ~1000 | -- | Al2O3 | -- | n = 1.44 |
Strontium Oxide | SrO | 2460 | 4.7 | -- | -- | -- | 1500 | -- | Al2O3 | Mo | Reacts with Mo, and W; n = 1.87 |
........sublimes........ | |||||||||||
Strontium Sulphide | SrS | Above 2000 |
3.70 | -- | -- | -- | -- | -- | -- | Mo | Decomposes. n = 2.11 |
Sulphur | S8 | 115 | 2.0 | -- | 13 | 19 | 57 | ebeam (Poor) | Quartz | W | Poisons vacuum system. |
Supermalloy | Ni/Fe/Mo | 1410 | 8.9 | -- | -- | -- | -- | ebeam (Good) | -- | -- | Sputtering preferred; co-evaporate from 2 sources, Permalloy and Mo. |
Tantalum | Ta | 2996 | 16.6 | -- | 1960 | 2240 | 2590 | ebeam (Xlnt) | -- | -- | Forms good films. |
Tantalum Boride | TaB2 | 3000 | 12.38 | -- | -- | -- | -- | -- | -- | -- | -- |
Tantalum Carbide | TaC | 3880 | 14.65 | -- | -- | -- | ~2500 | -- | -- | -- | JVST 12, 811 (1975) |
Tantalum Nitride | TaN | 3360 | 16.30 | -- | -- | -- | -- | -- | -- | -- | Reactive; evaporate Ta in 10-3N2. |
Tantalum Pentoxide | Ta2O5 | 1800 | 8.74 | -- | 1550 | 1780 | 1920 | ebeam (Good) | VC | W, Ta | Slight decomposition; evaporate in 10-3 Torr of O2. n = 2.0 @ 1.5µ App. Opt. 19, 1737 (1980) |
Tantalum Sulphide | TaS2 | 1300 | -- | -- | -- | -- | -- | -- | -- | -- | -- |
Technetium | Tc | 2200 | 11.5 | -- | 1570 | 1800 | 2090 | -- | -- | -- | -- |
Teflon | PTFE | 330 | 2.9 | -- | -- | -- | -- | -- | -- | W | Baffled source. Film structure doubtful. |
Tellurium | Te | 452 | 6.25 | -- | 157 | 207 | 277 | ebeam (Poor) | Al2O3, Quartz | W, Ta | Wets without alloying. Toxic. |
Terbium | Tb | 1357 | 8.27 | -- | 800 | 950 | 1150 | ebeam (Xlnt) | Al2O3 | Ta | -- |
Terbium Fluoride | TbF3 | 1176 | -- | -- | -- | -- | ~800 | -- | -- | -- | -- |
Terbium Oxide | Tb2O3 | 2387 | 7.87 | -- | -- | -- | 1300 | -- | -- | Ir | Partially decomposes. |
Terbium Oxide | Tb4O7 | -- | -- | -- | -- | -- | -- | -- | -- | Ta | Films TbO. |
Thallium | Tl | 302 | 11.85 | -- | 280 | 360 | 470 | ebeam (Poor) | Al2O3, Quartz | W, Ta | Wets freely, very Toxic. |
Element | Symbol | Melting Point °C |
Density (bulk, g/cm3) | Z-ratio | Temperature°C @ Vapor Pressure (Torr) | Evaporation Method | Crucible | Boat | Remarks | ||
10-8 | 10-6 | 10-4 | |||||||||
Thallium Bromide | TlBr | 480 | 7.56 | -- | -- | -- | ~250 | -- | Quartz | Ta | Toxic n = 2.3 |
........sublimes........ | |||||||||||
Thallium Chloride | TlCl | 430 | 7.00 | -- | -- | -- | ~150 | -- | Quartz | Ta | Toxic n = 2.25 |
........sublimes........ | |||||||||||
Thallium Iodide (B) |
TlI | 440 | 7.09 | -- | -- | -- | ~250 | -- | Quartz | -- | Toxic n = 2.78 |
........sublimes........ | |||||||||||
Thallium Oxide | Tl2O3 | 717 | 9.65 | -- | -- | -- | 350 | -- | -- | -- | Toxic, Goes to Tl2O @ 850° C. |
Thorium | Th | 1875 | 11.7 | -- | 1430 | 1660 | 1925 | ebeam (Xlnt) | W | W, Ta, Mo | Toxic, radioactive. |
Thorium Bromide | ThBr4 | -- | 5.67 | -- | -- | -- | -- | -- | -- | Mo | Toxic n = 2.47 @ 5µ |
........sublimes........ | |||||||||||
Thorium Carbide | ThC2 | 2773 | 8.96 | -- | -- | -- | ~2300 | -- | Carbon | -- | Radioactive. |
Thorium Dioxide | ThO2 | 3050 | 10.03 | -- | -- | -- | ~2100 | ebeam (Good) | -- | -- | Radioactive. n = 1.86 @ 2.2µ |
Thorium Fluoride | ThF4 | 1110 | 6.3 | -- | -- | -- | ~750 | ebeam (Fair) | VC | Mo | Radioactive. n = 1.52 Heat substrate to above 150° C. JVST 12, 919, (1975) |
Thorium Oxyfluoride | ThOF2 | 900 | 9.1 | -- | -- | -- | -- | -- | -- | Mo, Ta | Radioactive. n = 1.52 |
Thorium Sulphide | ThS2 | -- | 6.80 | -- | -- | -- | -- | -- | -- | -- | Sputtering preferred; co-evaporate from 2 sources. |
Thulium | Tm | 1545 | 9.32 | -- | 461 | 554 | 680 | ebeam (Good) | Al2O3 | Ta | -- |
........sublimes........ | |||||||||||
Thulium Oxide | Tm2O3 | -- | 8.90 | -- | -- | -- | 1500 | -- | -- | Ir | Decomposes. |
Tin | Sn | 232 | 7.75 | 0.724 | 682 | 807 | 997 | eBeam (Xlnt), Thermal | Al2O3, Ta | Mo | Wets Mo; use Ta liner in EB guns. |
Tin Oxide | SnO2 | 1127 | 6.95 | -- | -- | -- | ~1000 | ebeam (Xlnt) | Al2O3, Quartz | W | Films from W oxygen deficient, oxidize in air. n = 2.0 |
........sublimes........ | |||||||||||
Tin Selenide | SnSe | 861 | 6.18 | -- | -- | -- | ~400 | ebeam (Good) | Quartz | -- | JVST 12, 110 (1975) |
Tin Sulphide | SnS | 882 | 5.08 | -- | -- | -- | ~450 | -- | Quartz | -- | -- |
Tin Telluride | SnTe | 780 | 6.44 | -- | -- | -- | ~450 | -- | Quartz | -- | -- |
Titanium | Ti | 1675 | 4.50 | 0.628 | 1067 | 1235 | 1453 | eBeam (Xlnt), Thermal | TiC | W | Alloys with refractory metals. Evolves gas on first heating. |
Titanium Boride | TiB2 | 2980 | 4.50 | -- | -- | -- | -- | ebeam (Poor) | -- | -- | -- |
Titanium Carbide | TiC | 3140 | 4.93 | -- | -- | -- | ~2300 | -- | -- | -- | JVST 12, 851, (1975) |
Titanium Dioxide (rutile) | TiO2 | 1640 | 4.29 | -- | -- | -- | ~1300 | ebeam (Fair) | -- | W, Mo | Evaporate in 10-4 of O2 onto 350° substrates. n = 2.4 App. Opt. 15, 2986 (1976) |
Titanium Monoxide | TiO | 1750 | 4.93 | -- | -- | -- | ~1500 | ebeam (Good) | VC | W, Mo | Use gentle preheat to outgas. Films TiO2 if evaporated like TiO2; n = 2.2 |
Titanium Nitride | TiN | 2930 | 5.43 | -- | -- | -- | -- | ebeam (Good) | -- | Mo | Sputtering preferred. Decomposes with thermal evaporation. |
Titanium Sesquioxide | Ti2O3 | 2130 | 4.6 | -- | -- | -- | -- | ebeam (Good) | -- | W | Decomposes. |
Tungsten | W | 3410 | 19.30 | 0.163 | 2117 | 2407 | 2757 | eBeam (good), Thermal | -- | -- | Forms violate oxides. Films hard & adherent. |
Tungsten Boride | WB2 | 2900 | 12.75 | -- | -- | -- | -- | eBeam (Poor) | -- | -- | -- |
Tungsten Carbide | W2C | 2860 | 17.15 | -- | 1480 | 1720 | 2120 | eBeam (Xlnt) | -- | C | -- |
Tungsten Telluride | WTe3 | -- | 9.49 | -- | -- | -- | -- | -- | Quartz | -- | -- |
Tungsten Trioxide | WO3 | 1473 | 7.16 | -- | -- | -- | 980 | ebeam (Good) | -- | W, Pt | Use gentle preheat to outgas. W reduces oxides slightly. n = 1.68 |
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Uranium | U | 1132 | 19.07 | -- | 1132 | 1327 | 1582 | eBeam (Good) | -- | W, Mo | Films oxidize. |
Uranium Carbide | UC2 | 2260 | 11.28 | -- | -- | -- | 2100 | -- | Carbon | -- | Decomposes. |
Uranium Dioxide | UO2 | 2176 | 10.9 | -- | -- | -- | -- | -- | -- | W | Ta causes decomposition. |
Uranium Fluoride | UF4 | ~1000 | -- | -- | -- | -- | 300 | -- | -- | Ni | -- |
Uranium Oxide | U3O8 | Decomposes | 8.3 | -- | -- | -- | -- | -- | -- | W | Decomposes at 1300° C to UO2. |
Uranium Phosphide | UP2 | -- | 8.57 | -- | -- | -- | 1200 | -- | -- | Ta | Decomposes. |
Uranium Sulphide | U2S3 | -- | -- | -- | -- | -- | 1400 | -- | -- | W | Slight decomposition. |
Vanadium | V | 1890 | 5.96 | -- | 1162 | 1332 | 1547 | eBeam (Xlnt) | -- | W, Mo | Wets Mo. EB evaporated films preferred. |
Vanadium Boride | VB2 | 2400 | 5.10 | -- | -- | -- | -- | -- | -- | -- | -- |
Vanadium Carbide | VC | 2810 | 5.77 | -- | -- | -- | ~1800 | -- | -- | -- | -- |
Vanadium Dioxide | VO2 | 1967 | 4.34 | -- | -- | -- | ~575 | -- | -- | -- | Deposit metal in 1 X 10-3O2 JVST A2(2) 301 (1984) |
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Vanadium Nitride | VN | 2320 | 6.13 | -- | -- | -- | -- | -- | -- | -- | -- |
Vanadium Pentoxide | V2O5 | 690 | 3.36 | -- | -- | -- | ~500 | -- | Quartz | -- | -- |
Vanadium Silicide | VSi2 | 1700 | 4.42 | -- | -- | -- | -- | -- | -- | -- | -- |
Ytterbium | Yb | 824 | 6.98 | -- | 520 | 590 | 690 | ebeam (Good) | -- | Ta | -- |
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Ytterbium | YbF3 | 1157 | 8.17 | -- | -- | -- | ~800 | -- | -- | Mo | n = 1.57 @3.8µ |
Ytterbium Oxide | Yb2O3 | 2346 | 9.17 | -- | -- | -- | ~1500 | -- | -- | Ir | Loses Oxygen. |
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Yttrium | Y | 1509 | 4.48 | -- | 830 | 973 | 1157 | ebeam (Xlnt) | Al2O3 | W, Ta | High Ta solubility |
Yttrium Aluminum Oxide | Y3Al5O12 | 1990 | -- | -- | -- | -- | -- | ebeam (Good) | -- | W | Films not terroelectric. |
Yttrium Fluoride | YF3 | 1387 | 4.01 | -- | -- | -- | -- | -- | -- | -- | -- |
Yttrium Oxide | Y2O3 | 2680 | 4.84 | -- | -- | -- | ~2000 | ebeam (Good) | C | W | Loses Oxygen. films smooth and clear. n = 1.79 @ 1µ |
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Zinc | Zn | 419 | 7.14 | 0.514 | 127 | 177 | 250 | eBeam (Xlnt), Thermal | Al2O3, Quartz | Mo, W, Ta | Evaporates well under wide range of conditions. |
Zinc Antimonide | Zn3Sb2 | 546 | 6.3 | -- | -- | -- | -- | -- | -- | -- | -- |
Zinc Bromide | ZnBr2 | 394 | 4.22 | -- | -- | -- | ~300 | -- | C | W | Decomposes. |
Zinc Fluoride | ZnF2 | 872 | 4.84 | -- | -- | -- | ~800 | -- | Quartz | Pt, Ta | -- |
Zinc Nitride | Zn3N2 | -- | 6.22 | -- | -- | -- | -- | -- | -- | Mo | Decomposes. |
Zinc Oxide | ZnO | 1975 | 5.61 | -- | -- | -- | ~1800 | ebeam (Fair) | -- | -- | Anneal in air at 450° C to reoxidize; n = 2.0 JVST 12, 879 (1975) |
Zinc Selenide | ZnSe | 1526 | 5.42 | -- | -- | -- | 660 | -- | Quartz | Mo, W, Ta | Use gentle preheat to outgas. Evaporates well n = 2.6. |
Zinc Sulphide | ZnS | 1830 | 4.09 | -- | -- | -- | ~800 | ebeam (Good) | -- | Ta, Mo | Use gentle preheat to outgas. Films partially decompose. Sticking coefficient varies with substrate temperature. n = 2.3 @ .5µ |
........sublimes........ | |||||||||||
Zinc Telluride | ZnTe | 1238 | 6.34 | -- | -- | -- | ~600 | ebeam (Fair) | -- | Mo, Ta | Use gentle preheat to outgas. n = 2.85 @ .5µ |
Zircon | ZrSiO4 | 2550 | 4.56 | -- | -- | -- | -- | -- | -- | -- | -- |
Zirconium | Zr | 1852 | 6.40 | -- | 1477 | 1702 | 1987 | eBeam (Xlnt) | -- | W | Alloys with W. Films oxidize readily. |
Zirconium Boride | ZrB2 | 3040 | 6.08 | -- | -- | -- | -- | ebeam (Good) | -- | -- | -- |
Zirconium Carbide | ZrC | 3540 | 6.73 | -- | -- | -- | ~2500 | -- | -- | -- | -- |
Zirconium Nitride | ZrN | 2980 | 7.09 | -- | -- | -- | -- | -- | -- | -- | Reactively evaporate in 10-3N2 atmosphere. |
Zirconium Oxide | ZrO2 | 2700 | 5.49 | -- | -- | -- | ~220 | ebeam (Good) | -- | W | Films oxygen deficient, clear and hard. n = 2.05 @.75µ |
Zirconium Silicide | ZrSi2 | 1700 | 4.88 | -- | -- | -- | -- | -- | -- | -- | -- |
Element | Symbol | Melting Point °C |
Density (bulk, g/cm3) | Z-ratio | Temperature°C @ Vapor Pressure (Torr) | Evaporation Method | Crucible | Boat | Remarks | ||
10-8 | 10-6 | 10-4 | |||||||||
G = Graphite Crucible; CG = Coated Graphite Crucible; Al2O3 = Alumina Crucible; BN = Boron Nitride Crucible; Mo = Molybdenum Crucible; Ta = Tantalum Crucible; TB = TiB2; ZB = ZrB2; W = Tungsten; VC = vitreous carbon;