Bruce Tube Furnace
High temperature furnance for wafer thermal oxide growth, wafer dopant diffusion, and metallization annealing.
Rapid Thermal Annealer
Rapid annealing of metal-semiconductor contacts and ion-implanted silicon wafers.
High temperature furnance for wafer thermal oxide growth, wafer dopant diffusion, and metallization annealing.
Rapid annealing of metal-semiconductor contacts and ion-implanted silicon wafers.