BYU Cleanroom

Lithography

• Mask Alignment
  • SUSS MicroTec (Tamarack)
  • EV Group (EVG)
  • OIA
  • ABM
  • Union Optical
• Mask Pattern Generators
  • Heidelberg Instruments
  • Oce^`
  • Miva Technologies
  • First EIE
• Wafer Spinning
  • Solitec
  • Laurell
  • Headway
  • Brewer Science

Measurements

• Ellipsometry
  • Gaertner Scientific
  • Horiba Group
  • Ocean Optics
  • DigiPol Technologies (Rudolph Instruments) 
  • Scientific Computing International
• Semiconductor Parameter Analyzer
  • Agilent
• Film Measurement
  • Nanospec
  • KLA Tencor
  • Scientific Computing International
• Optical Profiler
  • Zygo
  • Veeco
  • KLA-Tencor
• Profilometer
  • KLA-Tencor
  • Veeco

Annealing and Diffusion

• Rapid Thermal Annealer
  • Axic Incorporated AnnealSys
  • SPECS Technologies Corporation
• Thermal Diffusion
  • BTU International
  • Thermco Systems
  • MRL Industries
  • Centrotherm

Etching

• Reactive Ion Etching
  • Cannon Anelva
  • Surface Technology Systems (Now SPTS)
  • Oxford Instruments
  • Trion
  • Samco
  • Aviza Technology (SPTS)
• Etchers/Ashers
  • Tegal (SPTS)
  • JLS Designs
  • Axic
  • PVA TePla

• Chemical vapor Depostition (PECVD)
  • Surface Technology Systems (SPTS)
  • Oxford Instruments
  • Trion
  • Lam Research (Novellus)
  • Oerlikon Balzer

• Vapor Deposition
  • Denton Vacuum
  • CHA Industries
  • Veeco
  • BOC Edwards Temescal